合肥工业大学机械与汽车工程学院导师介绍：王旭迪

　　►个人简介
　　王旭迪，男，1974年出生，博士研究生学历，教授，1996年合肥工业大学真空技术及设备专业本科，2005年中国科学技术大学国家同步辐射实验室工学博士。2005年-2006年英国卢瑟福国家实验室访问学者。已发表SCI、EI源刊论文三十余篇，申请发明专利10项。主讲课程：真空物理，微纳加工技术等。

　　►研究领域
　　科研方向：微纳加工技术及其应用，真空检漏与计量
　　主持项目：国家863探索导向类项目，教育部留学基金，安徽省自然科学基金，企业项目等。

　　►发表论文
　　郑正龙; 王旭迪; 付绍军; 聚碳酸酯基片超疏水表面的制备与表征；真空科学与技术学报；2014-03-15
　　涂吕星; 王旭迪; 逆向热键合技术制作SU-8胶纳流控通道；真空科学与技术学报；2013-12-15
　　李鑫; 王旭迪; 基于PDMS微结构模板转印技术的研究；真空科学与技术学报；2013-06-15
　　Jian Jin, Xudi Wang, Nano/micro-channel fabrication based on SU-8 using sacrificial resist etching method， Micro&Nano Letters  2012，7 1320
　　Liangjin Ge, Xudi Wang, Huoyao Chen，Flexible subwavelength gratings fabricated by reversal soft UV nanoimprint，CHINESE OPTICS LETTERS 10(9), 090502(2012),
　　Liangjin Ge, L. Jay Guo, Xudi Wang，Silver lines electrode patterned by transfer printing, Microelectronic Engineering 97 (2012) 289–293
　　Xiaojun Li, Xudi Wang,et al, Fabrication of size-controllable nanofluidicchannels using angled physical vapor deposition, Microelectronic Engineering vol. 98 October, 2012. p. 647-650
　　Y. Zhang, X. Wang, Y. Xing et al. One-Step Growth and Alignment of Ultralong Nanowire Arrays and Their Flexible Photodetector Devices. J. Mater. Chem., 2012, 22, 14357
　　Xiaojun Li, Yong Chen, Keqiang Qiu, Xudi Wang, Multiple centimetre-long fluidic-channels with smooth and vertical sidewall fabricated by novel NIL mould and thermal bonding, Microelectronic Engineering 98,(2012) 720–724
　　X. Wang, J. Jin, X. Li et al, Low-pressure thermal bonding, Microelectron Eng. 88 (2011) 2427–2430
　　X. Li, X.Wang, et al, Fabrication of micro/nano fluidic system combining hybrid mask-mould lithography with thermal bonding, Microelectron Eng, 87(2010), 722-755
　　X. Wang, L. Ge, J. Lu, S. Fu, Z Cui. Fabrication of Enclosed Nanofluidic channels by UV cured imprinting and thermal bonding of SU-8 Photoresist. Microelectron Eng. 86(2009), 1347-1349
　　X. Wang, Yifang Chen, Ling Wang and Zheng Cui. Fabrication of nanoimprint template in Si with high etch rate by non-switch DRIE process. Microelectron Eng. 85(2008), 1015-1017
　　X. Wang, Y. Chen, S. Fu, Z Cui. Free-standing SU-8 subwavelength gratings fabricated by UV curing imprint. Microelectron Eng. 85(2008), 910-913
　　X. wang, Y. liu,X. Xu, S. Fu, Z Cui. Reactive ion beam etching of HfO2 film and removal of sidewall of sidewall redeposition. J. Vac. Sci. Technol. A ,24 (4): 1067-1072 JUL-AUG 2006
　　X Wang, Y. Chen, S. Fu, Z Cui. High density patterns fabricated in SU-8 by UV curing nanoimprint；Microelectron Eng., 84(2007), 872-876
　　X wang, Liangjin Ge, Jingjing Lu, Shaojun Fu, High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint, SPIE,Vol. 7159, (2008)
　　X. Wang, Y. Chen, S. Fu, Z Cui. Rapid nanofabrication with high density pattern with UVN30 Chemically Amplified Resist. SPIE,Vol. 6724, 67240A, (2007)
　　X. Wang, Y. Chen, S. Fu, Z Cui.Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint. SPIE, Vol. 6827, 68271T, (2007)
　　X.Wang et al, Reactive ion beam etching of HfO2 film using Ar/CHF3 gas chemistries, SPIE,5636,577(2005)
　　Z Cui, X. Wang, Y Li, G Y Tian, High sensitive magnetically actuated micromirrors for magnetic field measurement. Sensors and Actuators A 138 (2007) 145–150
　　Chen, YF; X. Wang, et al, Nano metamaterials and photonic gratings by nanoimprint and hot embossing, IEEEConference: International Symposium on Biophotonics, Nanophotonics and Metamaterials, Date: OCT 16-18, 2006 Hangzhou PR CHINA
　　Y. Chen, L. Zheng,  X. Wang et al. Fabrication of ferromagnetic  nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique. Microelectron Eng., 84(2007), 1499-1502

　　►联系方式
　　电子邮箱：wxudi@hfut.edu.cn